Once the right materials have been identified and grown, they will be used to pattern nanostructures. Techniques for pattern definition such as advanced electron-beam and ion-beam lithography and industrially relevant deep UV optical lithography and nano-imprint will be compared and the ideally suited technique will be identified.
The defined patterns are transferred into nanopillars, wires and other structures for spin torque devices by advanced pattern transfer techniques including dry ion milling, reactive ion milling and wet etching. Finally the devices will be contacted for current injection. Later, this nanofabrication can be combined with CMOS back-end to fabricate a demonstrator device.